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AZO thin films CIGSe 3 nm in size Ablation laser Buffer Couple TEM Resistive switching Etching B2 Semiconducting alloys Plasma etching Amyloid precursor Oxides Alzheimer's disease Biomasse Colloidal solution Atomic layer etching A3 Physical vapor deposition processes Amorphous Scanning electron microscopy B3 Solar cells Biofilms microbiens Capacitance AlN Physical vapor deposition Aryl-diazonium salts B2 Quaternary Thin films CH4 CHLORINE PLASMAS Residual stress Low-pressure plasma processing Chalcogenide Structure Biocapteurs Calcined clay Mass spectrometry Ambipolar material A Multilayers X-ray diffraction Integrated optics Mott insulators Nanotubes Optical properties Magnetron sputtering B1 Inorganic compounds TiO2 BOMBARDMENT A Thin films Bipolar resistive switching BRS Spectroscopic ellipsometry V2O3 B2 Semiconducting indium compounds Biomembranes Avalanche breakdown Titanium dioxide Transfert d'énergie Argon InP chlorine etching inductive coupled plasma ICP modeling plasma sheath simulation Anatase Sol-gel Band gap XPS Mott insulator Carbon Nanocomposite Thin film Kirkendall effect Semiconductors Transmission electron microscopy Annealing Optical waveguides Bixbyite Selenization AuCu alloy Alloying Films Rutile Non-volatile memory SF 6 Carbon Nanotube Optical interferometry PECVD Applications industrielles Adsorption Plasmas froids Copper CNTs’ collapse C Photoelectron spectroscopy B Chemical synthesis A1 Characterization Functionalization Vanadium Sesquioxide Aluminium nitride CaTiO3Pr^3^+ A-CNx Atomic force microscopy NEXAFS A Chalcogenides Sputtering X-ray photoelectron spectroscopy Band alignment